日本給予美光科技(MU.US)最多13億美元補貼 支持在日本生產晶片
日本政府已通過最多1,920億日圓(相當於13億美元)補貼,支持美光科技(MU.US)在廣島生產新一代晶片,進一步加強日本本土的晶片製造。
日本經濟產業大臣西村康稔表示,有關經費將用以協助美光,引進艾司摩爾(ASML.US)的極紫外微影(EUV)設備,以生產先進晶片。這些晶片是驅動生成式人工智慧(AI)、數據中心及自駕技術的關鍵。有關經費佔美光日本投資計劃大約40%。
西村康稔指,相關投資是必要的,以保證日本有足夠的先進晶片,確保未來經濟安全。日本政府已準備最高1,670億日圓支持美光的生產成本,另已準備最高250億日圓用作發展成本。美光早前承諾在日本投資5,000億日圓,以最先進的1-gamma製程生產新一代晶片。
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