上海新陽(300236.SZ):開發的芯片鋁製程無羥胺幹法蝕刻後清洗液技術,突破了幾十年來嚴重依賴羥胺這樣一種全球只有一家生產供應商的困局
格隆匯5月10日丨上海新陽(300236.SZ)於2023年5月9日15:00-16:30召開業績説明會,就“年報顯示公司經過自主研發攻關,“卡脖子”的關鍵原材料項目——非羥胺項目報吿期內取得重大技術突破,已開發出滿足晶圓製造企業要求的無羥胺幹法蝕刻後清洗液產品。目前該產品已通過國內主流晶圓製造客户的驗證,標誌着我司對鋁製程清洗技術的理解與研發能力已走在世界前列。請介紹下無羥胺幹法蝕刻後清洗液產品有哪些技術優勢及市場前景。”,公司表示,公司開發的芯片鋁製程無羥胺幹法蝕刻後清洗液技術,突破了幾十年來嚴重依賴羥胺這樣一種全球只有一家生產供應商的困局,在全球鋁製程幹法刻蝕後清洗液率先實現了突破。同時,該技術也具有清洗效果優異,介質兼容性好,工藝窗口寬,使用壽命長等特點。未來將成為替代現有芯片鋁製程清洗液市場很有發展潛力的一款產品。
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